我的翻译:The study of the preparation of metal film and its characteristics already is the microelectronics and materials science as an important issue. This thesis mainly discusses the sputtering film coating principle, the growth of thin films is dynamic technology, and in the research on the application of physics experiment. Also explores the related experimental teaching equipment design,some of the features about the experiment content of layout aspects. With the development of coating technology, this topic also existed a lot of subsequent research work.
The preparation of metal film and its characteristics already is an important issue of the microelectronics and materials science.This thesis mainly discusses the sputtering film coating principle, the growth of thin films dynamic technology, and in the research on the application of physics experiment.Also explores the design of related experimental teaching equipment , the experiment content of layout aspects of some of the features.Along with the development of coating technology, there are a lot of subsequent research work of this topic.
Metal film preparation and its property study is one of the important topic of microelectronics and materials science. This paper mainly discusses the principle of sputtering, thin film growth technology, and its application in physics experiment research. Also explored the related experiment teaching device design, experimental content arrangement of some of the features. Along with the development of coating technology unceasing development, the topic and there are a lot of the follow-up study.